Chemical Vapor Deposition: Surface Engineering Series, Volume 2

  • 9h 58m
  • Jong-Hee Park, T.S. Sudarshan (eds)
  • ASM International
  • 2001
Providing detailed descriptions of several novel methods of application of CVD technology, this reference book presents the basic principles and process characteristics of chemical vapor deposition, and the details of innovative approaches to its application in a wide variety of industrial applications.