High-k Gate Dielectrics for CMOS Technology

  • 12h 9m
  • Gang He, Zhaoqi Sun
  • John Wiley & Sons (US)
  • 2012
Presenting a state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, this book discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies.