Nano-CMOS Circuit and Physical Design

  • 8h 35m
  • Anurag Mittal, Ban P. Wong, Greg Starr, Yu Cao
  • John Wiley & Sons (US)
  • 2005

The fast pace of new technology and the challenges of nano-scaling are bringing together the once-separate disciplines of circuit design, technology device physics, and physical implementation. A good understanding of the underlying physical constraints of device, interconnect, and manufacturing is crucial for designing circuit systems and devices and making sound technology decisions. Nano-CMOS Circuit and Physical Design integrates the nanometer process, device manufacturability, advanced circuit design, and related physical implementation into a single, seamless approach to advanced semiconductor technology.

This comprehensive volume explores new developments in devices and processing; presents design issues, paying special attention to technology/design interactions such as signal integrity and interconnects; and addresses the impact of design for manufacturability and variability.

Important topics include:

  • Nano-CMOS process scaling issues and implications on design
  • Subwavelength optical lithography
  • Physics and theory of operation issues and solutions
  • Design for manufacturability and variability

Written by expert practitioners, Nano-CMOS Circuit and Physical Design is a useful resource for IC designers and professionals in the field, providing them with practical design solutions and approaches.

In this Book

  • Nano-CMOS Scaling Problems and Implications
  • Cmos Device and Process Technology
  • Theory and Practicalities of Subwavelength Optical Lithography
  • Mixed-Signal Circuit Design
  • Electrostatic Discharge Protection Design
  • Input/Output Design
  • DRAM
  • Signal Integrity Problems in On-Chip Interconnects
  • Ultralow Power Circuit Design
  • Design for Manufacturability
  • Design for Variability