Teach Yourself the Basics of Aspen Plus

  • 2h 31m
  • Ralph Schefflan
  • John Wiley & Sons (US)
  • 2011

The complete step-by-step guide to mastering the basics of Aspen Plus software

Used for a wide variety of important scientific tasks, Aspen Plus software is a modeling tool used for conceptual design, optimization, and performance monitoring of chemical processes. After more than twenty years, it remains one of the most popular and powerful chemical engineering programs used both industrially and academically.

Teach Yourself the Basics of Aspen Plus delivers important fundamentals on using Aspen Plus software correctly from day one. Lecture-style chapters set the tone for maximizing the learning experience by presenting material in a manner that emulates an actual workshop classroom environment. Important points are emphasized through encouragement of hands-on learning techniques that direct learners toward achievement in creating dynamic designs and effective control structures fluidly and with confidence. Teach Yourself the Basics of Aspen Plus includes:

  • Examples embedded within the text to focus the reader on specific aspects of the material being covered
  • Workshops at the end of each chapter that provide opportunities to test the reader's knowledge in that chapter's subject matter
  • Coverage of physical and thermodynamics properties, the regression system, heat exchangers, reactors, optimization, and difficult equilibrium separations such as azeotropic distillation

Designed with both students and professionals in mind, Teach Yourself the Basic of Aspen Plus is like having a personal professor 24/7. Its revolutionary format is an exciting way to learn how to operate this highly sophisticated software—and a surefire way for readers to get the results they expect.

About the Author

RALPH SCHEFFLAN has been an Adjunct Professor at Stevens Institute of Technology (SIT) for the past twenty-nine years. He has taught four graduate courses—thermodynamics, process simulation, numerical methods, and equilibrium stage operations—during his time there, as well as being SIT's representative to Aspen Technology. Dr. Schefflan introduced process simulation at SIT evolving from Flowtran to Aspen Plus. In his twenty-two years at Hoffmann-LaRoche he also introduced process simulation and was a founding member of the Flowtran Users Group.

In this Book

  • Introduction to Aspen Plus
  • Properties
  • The Simple Blocks
  • Processes with Recycle
  • Flowsheeting and Model Analysis Tools
  • The Data Regression System
  • Flashes and Decanter
  • Pressure Changers
  • Heat Exchangers
  • Reactors
  • Multistage Equilibrium Separators
  • Process Flowsheet Development
  • Optimization
  • Complex Equilibrium Stage Separations